New plasma device to treat hair loss
The prevalence of hair loss (Alopecia) is increasing due changing lifestyle pattern, increased emphasis on appearances among the young population, high level of stress and rising geriatric population. In addition, hair loss cases are rising due to chronic diseases such as Polycystic Ovary Syndrome (PCOS), cancer, or rheumatoid arthritis.
Current treatment options for hair-loss are expensive hair transplant surgery, laser and light-based therapies or drug medication (Rogaine and Propecia). Commonly side effects include local irritation of the scalp with scaling, redness and itching, burning or irritation of the eye and the development of allergic contact dermatitis. Furthermore, there are cases of persistent sexual, neurological, mental and physical side effects reported.
Our scientists at the HAWK in Göttingen, Germany developed a brush-like low-temperature plasma device for treatment of the scalp. The device can significantly enhance microcirculation as well as oxygen saturation, which are key parameters for stimulating hair growth.
Perspective view of an exemplary design of the plasma device (source: DE102019128538.0).
Treatment of the scalp for stimulating hair growth.
First plasma devices are currently in the testing stage at laboratory scale.
We have filed a priority patent application (applicant: HAWK University of Applied Sciences and Art Hildesheim, Holzminden, Göttingen).
Dr. Stefan Uhle