New plasma device to treat hair loss

The prevalence of hair loss (Alopecia) is increasing due changing lifestyle pattern, increased emphasis on appearances among the young population, high level of stress and rising geriatric population. In addition, hair loss cases are rising due to chronic diseases such as Polycystic Ovary Syndrome (PCOS), cancer, or rheumatoid arthritis. Scientists at the HAWK in Göttingen, Germany developed a new brush-like plasma device for treatment of the scalp to promote hair growth. The device can significantly enhance microcirculation as well as oxygen saturation, which are key parameters for stimulating hair growth.

Challenge

Current treatment options for hair-loss are expensive hair transplant surgery, laser and light-based therapies or drug medication (Rogaine and Propecia). Commonly side effects include local irritation of the scalp with scaling, redness and itching, burning or irritation of the eye and the development of allergic contact dermatitis. Furthermore, there are cases of persistent sexual, neurological, mental and physical side effects reported.
Thus, there is a high unmet need for inexpensive treatment options without the whole list of unwanted side effects.

Our Solution

Our scientists at the HAWK in Göttingen, Germany developed a brush-like low-temperature plasma device for treatment of the scalp. The device can significantly enhance microcirculation as well as oxygen saturation, which are key parameters for stimulating hair growth.

Source: HAWK

Advantages

Applications

Treatment of the scalp for stimulating hair growth.

Development Status

First plasma devices are currently in the testing stage at laboratory scale.

Patent Status

Patents have been granted in DE, EP and US (DE102019128538B3EP4048395B1US12159769B2, Patent holder: HAWK University of Applied Sciences and Art Hildesheim, Holzminden, Göttingen).

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