New plasma device to treat hair loss
The prevalence of hair loss (Alopecia) is increasing due changing lifestyle pattern, increased emphasis on appearances among the young population, high level of stress and rising geriatric population. In addition, hair loss cases are rising due to chronic diseases such as Polycystic Ovary Syndrome (PCOS), cancer, or rheumatoid arthritis.
Scientists at the HAWK in Göttingen, Germany developed a new brush-like plasma device for treatment of the scalp to promote hair growth. The device can significantly enhance microcirculation as well as oxygen saturation, which are key parameters for stimulating hair growth.
Challenge
Current treatment options for hair-loss are expensive hair transplant surgery, laser and light-based therapies or drug medication (Rogaine and Propecia). Commonly side effects include local irritation of the scalp with scaling, redness and itching, burning or irritation of the eye and the development of allergic contact dermatitis. Furthermore, there are cases of persistent sexual, neurological, mental and physical side effects reported.
Thus, there is a high unmet need for inexpensive treatment options without the whole list of unwanted side effects.
Our Solution
Our scientists at the HAWK in Göttingen, Germany developed a brush-like low-temperature plasma device for treatment of the scalp. The device can significantly enhance microcirculation as well as oxygen saturation, which are key parameters for stimulating hair growth.
Perspective view of an exemplary design of the plasma device (source: DE102019128538.0).
Advantages
- Plasma electrode array for effective plasma treatment (“plasma brush”).
- No electric field is built up between the individual electrodes.
- Plasma only ignites from the electrodes to the scalp.
- Nonthermal (cold) plasma can be safely applied to skin.
- Dielectric spacer at the end of the electrodes - serves as a spacer & as scratch protection for the scalp.
- Easy to handle plasma device for simple but effective home application.
Applications
Treatment of the scalp for stimulating hair growth.
Development Status
First plasma devices are currently in the testing stage at laboratory scale.
Patent Status
Patent applications have been filed in EP and US and a German patent has been granted (DE102019128538B3, EP4048395A1, US20220238308A1, Patent holder/Applicant: HAWK University of Applied Sciences and Art Hildesheim, Holzminden, Göttingen).
Contact
Dr. Stefan Uhle
Patent Manager Life Science
E-Mail: This email address is being protected from spambots. You need JavaScript enabled to view it.
Tel: +49 551 30724 154
Reference: BioC-2186-HAWK
Tags: Plasma physics
